Martha Sanchez

Research Staff Member, IBM Research-Almaden

Sanchez received my B.S. degree from the University of Maryland at College Park, and M.S. degree from Stanford University, both in Chemical Engineering. She joined IBM’s General Products Division in 1982, first as a process engineer in disk manufacturing and later worked in failure analysis. Sanchez transferred to IBM’s Research Division in 1989 and worked on process development and characterization of low dielectric polymers. She then worked on fundamental studies of photoresists for extendibility to sub-100 nm scale dimensions. This work stimulated awareness in the industry of resist resolution limitations and parameters affecting LER (line edge roughness). Currently, she is working on the development of e-beam and next-generation photoresists.

Her interests are in polymer processing and material characterization of polymers using optical and nonoptical microscopy, such as Scanning Electron Microscopy and Atomic Force Microscopy, and spectroscopic techniques including Infrared Spectroscopy. She is a co-author of approximately 70 publications and four patents and co-authored a book chapter in Applied Scanning Probe Methods. Honors received include the Arthur K. Doolittle Award from the American Chemical Society (1992), and several IBM recognition awards. Sanchez chaired the 2016 and 2017 SPIE Advanced Lithography Symposium's Metrology, Inspection, and Process Control for Microlithography Conference and the 2016 Lithography Workshop.


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